Wafer Fabrication Equipment

  1. LEYBOLD E-BEAM EVAPORATOR, 4 POCKET

    Electron Beam Evaporators

    LEYBOLD E-BEAM EVAPORATOR, 4 POCKET

    E-Beam Evaporator with Ion Source

  2. OXFORD INSTRUMENTS PLASMALAB 100 PECVD

    Single Chamber PECVD Tools

    OXFORD INSTRUMENTS PLASMALAB 100 PECVD

    PECVD TEOS Tool with Load Lock

    NB: System needs a computer-software upgrade.  Selling this system AS IS, WHERE IS.

    Make: Oxford Instruments

    Model: Plasmalab System 100

    1 unit @ Best Price

  3. ADVANCED ENERGY RADIO FREQUENCY GENERATOR POWER SUPPLY, 10000 WATT, 40 KHZ

    Radio Frequency (RF) Generators

    ADVANCED ENERGY RADIO FREQUENCY GENERATOR POWER SUPPLY, 10000 WATT, 40 KHZ

    Radio Frequency Generator Representative photo

  4. ENI POWER SYSTEMS RF GENERATOR 1250W, 13.56 MHZ

    Radio Frequency (RF) Generators

    ENI POWER SYSTEMS RF GENERATOR 1250W, 13.56 MHZ

    Radio Frequency Generator Acquired by MKS Instruments Representative photo

  5. SEREN RF GENERATOR, 600 WATTS

    Radio Frequency (RF) Generators

    SEREN RF GENERATOR, 600 WATTS

    RF Generator Part number 9600610028.

  6. PLASMATHERM ICP PLASMA ETCHER

    Poly/Nitride Etchers

    PLASMATHERM ICP PLASMA ETCHER

    Inductively Coupled Plasma Etcher with 9.5 Inch Electrode

  7. SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER

    Silicon Etchers

    SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER

    Silicon Etcher - Year 2003

    Make: Surface Tech Sys

    Model: MXP Multiplex ICP ASE HR

    1 unit @ Best Price

  8. CHA SEC 1000 RAP ELECTRON BEAM EVAPORATOR

    Electron Beam Evaporators

    CHA SEC 1000 RAP ELECTRON BEAM EVAPORATOR

    Six Pocket Ebeam Gun, (2)Resistance Sources, 6kW Heater Array, 25.5" Bell Jar, Cryo PumpedThe CHA SEC-1000-RAP high-vacuum EBeam deposition system designed for use in production and research environments.

  9. BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM

    Robotic PR Coater Tracks

    BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM

    Programmable Automated Coat/Bake Track System
  10. VARIAN 3190 SPUTTER SYSTEM

    Standalone Sputterers

    VARIAN 3190 SPUTTER SYSTEM

    Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter Currently configured for 100mm wafers3 Target mini-quantumsRF EtchVIPS (Vacuum Isolated Processing Station)Residual Gas Analyzer

  11. KAUFMAN & ROBINSON END-HALL ION SOURCE WITH WATER COOLED FRONT PLATE

    Other Ion Beam Equipment

    KAUFMAN & ROBINSON END-HALL ION SOURCE WITH WATER COOLED FRONT PLATE

    Gridless End-Hall Ion Source With Water Cooled Front Plate

  12. SUSS MICROTEC FALCON ACS 200

    Automated Coating and Developing Cluster System

    SUSS MICROTEC FALCON ACS 200

    Fully Automated High Throughput Coating, Developing Cluster System  System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.

    Make: Suss MicroTec

    Model: FALCON - ACS 200

    1 unit @ Best Price